The present disclosure relates to an ultra-high vacuum manufacturing method for a radiation shielding film and, more specifically, an ultra-high vacuum manufacturing method for a radiation shielding film, using an antimony-tungsten alloy, can provide a radiation shielding film having an excellent shielding rate and minimized void generation while using antimony, which has excellent processability and economic feasibility. The ultra-high vacuum manufacturing method for a radiation shielding film, according to one embodiment of the present invention, comprises the steps of: mixing a first shielding component and a tungsten powder so as to obtain a first mixture; mixing the first mixture with a polymer component so as to obtain a second mixture; using ultra-high vacuum to remove bubbles from the second mixture, thereby obtaining a third mixture; and manufacturing a shielding sheet having a thickness of 1.0 mm or less by using the third mixture.
- 출원번호 : KR2025/009862
- 출원인 : INDUSTRY ACADEMIC COOPERATION FOUNDATION KEIMYUNG UNIVERSITY
- 특허번호 :
- IPC : G21F-001/08(2006.01);G21F-001/10(2006.01);G21F-001/12(2006.01);