Provided herein is technology relating to quality assurance programs for external radiation therapy beam delivery systems and particularly, but not exclusively, to integrated devices and systems for daily quality assurance testing and validation of beam energy and range and for high precision measurements of beam position, shape, and size.

• 출원번호 : US2025/037822
• 출원인 : LEO CANCER CARE, INC.;SOLVIS INC.;
• 특허번호 :
• IPC : A61N-005/10(2006.01);G02B-026/08(2006.01);G02B-027/09(2006.01);G02B-005/08(2006.01);G01T-001/208(2006.01);A61B-006/03(2006.01);A61B-006/58(2024.01);

A resist composition comprising a hypervalent iodine compound, an onium salt, a carboxy-containing compound, and a solvent is provided. When processed by photolithography using high-energy radiation, the resist composition exhibits a high sensitivity and resolution. The non-chemically-amplified resist composition exhibits a high sensitivity and maximum resolution when processed by photolithography using high-energy radiation, typically EB and EUV lithography, and a patterning process using the same.

• 출원번호 : 19270858
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : C09D-167/06(2006.01);G03F-007/00(2006.01);G03F-007/004(2006.01);G03F-007/039(2006.01);G03F-007/09(2006.01);

A compact superconducting energy storage cell includes a CEC Coil Assembly comprised of a plurality of axially stacked CEC Coil Modules. Each CEC Coil Module has two, double-pancake HTS coils and at least one coil assembly circumferentially surrounding the coil core. The coil assembly has at least two coils of superconductor coil windings with at least one spacer disposed therebetween with the at least two coils and the at least one spacer being stacked along the central axis. An insulator sleeve is disposed about the CEC Coil Assembly. A radiation shield cup and a radiation shield cap together define a first interior containing the insulator sleeve encapsulating the four axially stacked CEC Coil Modules. An outermost enclosure having an outermost chamber and an outermost cap together define a second interior that contain the at least one inductor module disposed therein.

• 출원번호 : 19271369
• 출원인 : NDI Engineering Company
• 특허번호 :
• IPC : H01F-006/06(2006.01);H01F-006/04(2006.01);H01F-027/02(2006.01);

A knowledge graph-based nuclear power plant fault diagnosis and display method and system, an electronic device, and a storage medium. The method comprises the following steps: monitoring, in real time, a key device to be monitored, and acquiring real-time information of said key device (S101); on the basis of the real-time information, determining whether there is an anomaly early-warning for said key device (S102); if there is an anomaly early-warning, identifying a fault data feature of said key device (S103); acquiring a related knowledge graph model in a knowledge base and calling the knowledge graph model (S104); performing complex knowledge decomposition and reasoning on the basis of the related knowledge graph model and the fault data feature to obtain a fault diagnosis result (S105); and displaying the fault diagnosis result (S106).

• 출원번호 : CN2025/108620
• 출원인 : SUZHOU NUCLEAR POWER RESEARCH INSTITUTE CO.,LTD;YANGJIANG NUCLEAR POWER CO., LTD.;
• 특허번호 :
• IPC : G06F-018/24(2023.01)

Circuit arrangement (1) for identifying the binning-class/es of at least one light unit (2) and for controlling the at least one light unit (2) in dependence of its binning class, wherein the circuit arrangement (1) comprises at least one microcontroller (6), and at least one light unit (2), the light unit (2) comprises at least one light module (3a, 3b), wherein each light module (3a, 3b) is classified by a binning class, said binning class representing radiation characteristics of its light sources (4), at least one light controller (5a, 5b), the microcontroller (6) being configured to select a specific operation mode (A, B, C, D, . . . ) and to configure the light controller (5a, 5b) accordingly to adjust the light emission radiated by the at least one light module (3a, 3b) in dependence of its binning class.

• 출원번호 : 19270426
• 출원인 : ZKW Group GmbH
• 특허번호 :
• IPC : H05B-047/175(2020.01)

Methods of reducing skin fibrosis by prophylactically treating skin prior to radiation therapy arc described herein. The methods include applying an effective amount of DFO to skin that may be subjected to radiation, e.g., before treatment for cancer at a treatment site. The DFO may be administered transdermally.

• 출원번호 : 19270093
• 출원인 : THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY
• 특허번호 :
• IPC : A61K-031/16(2006.01);A61K-009/00(2006.01);A61P-017/02(2006.01);

The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a substrate having a first side and a second side opposing the first side. An isolation structure has one or more dielectric materials disposed along the second side of the substrate on opposing sides of a pixel region. A micro-lens is disposed over the substrate and is configured to focus incident radiation onto a focal region that is within the pixel region. In a top-view the focal region is separated from the isolation structure by a first distance between the focal region and a center of a sidewall of the isolation structure and by a second distance between the focal region and a corner of the isolation structure. The first distance is in a range of between approximately 0 nm (nanometers) and approximately 50 nm and the second distance is in a range of between approximately 10 nm and approximately 250 nm.

• 출원번호 : 19269099
• 출원인 : Huang, Cheng Yu
• 특허번호 :
• IPC : H10F-039/00(2025.01)

Identification document personalization systems and methods that use a cure lamp to both pin (i.e. partially cure) radiation curable material printed on the surface of an identification document and completely or fully cure radiation curable material printed on the surface of the identification document. This eliminates the need to have both a pinning lamp and a cure lamp, which reduces the cost and complexity of the system and reduces the cost of the system.

• 출원번호 : 19269965
• 출원인 : WAWRA, Jon
• 특허번호 :
• IPC : B41M-007/00(2006.01);B41J-003/407(2006.01);B41J-003/54(2006.01);B41J-011/00(2006.01);B41M-003/00(2006.01);B41M-003/14(2006.01);B41M-005/00(2006.01);B42D-025/23(2014.01);

PROBLEM TO BE SOLVED: To provide a method or forming a resist pattern and a radiation-sensitive resin composition which have excellent performance in sensibility, resolution or the like in an exposure process when a next generation exposure technique is applied.SOLUTION: A method or forming a resist pattern includes: (1) a step of forming a resist film having a content of (C) a radiation-sensitive acid generator of 0.1 mass% or less; (2) a step of exposing the resist film by EUV or electron beam (EB); and (3) a step of developing the resist film exposed in the step (2). In the step (1), the resist film is formed of (A) a radiation-sensitive resin composition, the radiation-sensitive resin composition contains a resin having a structural unit (a2) which includes a group dissociating by EUV or electron beam (EB) exposure in the absence of (A1) radiation-sensitive acid generator, the structural unit (a2) has a tertiary alkyl ester portion, and the structural unit (a2) is expressed by a specific structure.SELECTED DRAWING: None

• 출원번호 : 2025118665
• 출원인 : JSR CORP
• 특허번호 :
• IPC : G03F-007/039(2006.01);G03F-007/038(2006.01);C08F-220/16(2006.01);G03F-007/20(2006.01);

A method for preparing photosensitive glass and a use of photosensitive glass. A process for preparing photosensitive glass is controlled and improved, masking treatment is performed on two opposite main surfaces of a first region of a substrate glass comprising the first region and a second region, and the second region is not subjected to the masking treatment, so as to obtain double-sided masked substrate glass having the same structure; and radiation treatment is performed on the two main surfaces of the double-sided masked substrate glass having the same structure, such that an edge halo phenomenon of an exposed area of the photosensitive glass can be significantly improved, and good light shielding performance of the exposed area can be achieved.

• 출원번호 : CN2025/108683
• 출원인 : CHONGQING AUREAVIA HI-TECH GLASS CO., LTD.
• 특허번호 :
• IPC : C03C-004/04(2006.01);C03C-003/095(2006.01);C03C-023/00(2006.01);C03B-032/02(2006.01);