A system of adjusting the phase of a user's circadian rhythms, said system comprising: a high EML light source configured for delivering pulsed high EML light in a pulsed mode of operation, wherein the pulsed high EML light has a frequency and intensity sufficient to effect circadian phase adjustment in said user, and secondary functionality comprising transmitting electromagnetic radiation (EMR) to said user.

• 출원번호 : 18813260
• 출원인 : Harrison, Benjamin
• 특허번호 :
• IPC : A61N-005/06(2006.01)

A method is disclosed of generating a classifier configured to detect an object corresponding to a type of interest in an inspection image generated using penetrating radiation, the method including generating training data associated with a plurality of training images including objects corresponding to the type of interest, using a generative adversarial network including a generator and a discriminator. The method further includes training the classifier by applying a machine learning algorithm either using only the generated training data or a combination of real and generated data, wherein generating the training data includes training the generator and the discriminator using initial training data associated with a plurality of observed images generated using penetrating radiation, one or more observed images including an object corresponding to the type of interest.

• 출원번호 : 18813841
• 출원인 : MERIGUET, Pierre
• 특허번호 :
• IPC : G06V-020/00(2006.01);G06T-007/00(2006.01);G06V-010/764(2006.01);G06V-010/774(2006.01);G06V-010/82(2006.01);

An image pickup apparatus capable of efficiently cooling a mounted recording medium. The image pickup apparatus comprises a grip portion including a protrusion portion protruding toward a subject side in an optical axis direction of the image pickup apparatus, wherein the grip portion is provided at an end portion of a main body, a medium circuit board on which a medium accommodation portion for accommodating a recording medium is mounted, wherein the medium circuit board is disposed on a side opposite to the subject side in the optical axis direction with respect to the protrusion portion, a main circuit board disposed substantially orthogonal to the optical axis, a cooling duct including a first extension portion extending parallel to the optical axis direction in the grip portion, wherein the cooling duct is thermally connected to the medium circuit board and the main circuit board.

• 출원번호 : 18813526
• 출원인 : OYA, YOJI
• 특허번호 :
• IPC : G03B-017/55(2006.01)

The present invention relates to radiation-curable polyurethane dispersions having a particularly high double-bond density. These polyurethane dispersions can be used independently as coating agents, or especially advantageously added to conventional polyacrylate dispersions or to radiation-curing polyurethane dispersions in order to improve the properties in use thereof.

• 출원번호 : EP2024/073645
• 출원인 : COVESTRO DEUTSCHLAND AG
• 특허번호 :
• IPC : C08G-018/22(2006.01);C08G-018/24(2006.01);C08G-018/34(2006.01);C08G-018/73(2006.01);C08G-018/75(2006.01);C08G-018/79(2006.01);C08G-018/81(2006.01);C09D-175/14(2006.01);

PROBLEM TO BE SOLVED: To provide an illumination system for photodynamic therapy.SOLUTION: An illumination system 1 for photodynamic therapy includes an illumination source 2 configured to irradiate electromagnetic radiation 3 to irradiate a target surface 4 during operation, and an electronic control unit 5. The illumination source is configured to allow intensity of emitted electromagnetic radiation to change. The control unit is operably coupled to the illumination source and is configured to control operation of the illumination source according to an illumination protocol during an illumination session. The illumination protocol includes an instruction to operate the illumination source, and a mode includes a) a first mode, b) a second mode, and c) a third mode. Strength of the emitted electromagnetic radiation is lower during a dark period than during an illumination period, or the illumination source does not emit electromagnetic radiation during the dark period, while the illumination source emits electromagnetic radiation during the illumination period.SELECTED DRAWING: Figure 1

• 출원번호 : 2024142021
• 출원인 : MARUHO CO LTD
• 특허번호 :
• IPC : A61N-005/06(2006.01)

• 출원번호 : JP2024/030066
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-025/18(2006.01);C07C-309/64(2006.01);C07C-309/73(2006.01);C07C-381/12(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);

The present invention provides an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) which comprises: a repeating unit (a-1) that contains at least a phenolic hydroxyl group and an aromatic ring in which two or more aromatic rings are fused together or an aromatic ring in which two or more aromatic rings are linked via a single bond; and a repeating unit (a-2) that contains at least an aromatic ring in which two or more aromatic rings are fused together or an aromatic ring in which two or more aromatic rings are linked via a single bond, and a structure which is protected by a group from which a phenolic hydroxyl group or a carboxyl group is detachable by the action of acid. In the resin (A), the sum of the repeating units (a-1) and the repeating units (a-2) is not less than 80 mol% of the sum of all repeating units. The resin (A) has a weight-average molecular weight of 5000 or less.

• 출원번호 : JP2024/030065
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);C08F-212/04(2006.01);C08F-234/00(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);

The invention relates to a device for determining the refractive index and/or wall thickness of an object, preferably a planar object, comprising a first transmitter for terahertz radiation and a first receiver for terahertz radiation, the first transmitter being designed to transmit terahertz radiation to the object in a first main beam direction and the first receiver being designed to receive the terahertz radiation transmitted by the first transmitter after said radiation has passed through the object. The invention also relates to a corresponding method.

• 출원번호 : EP2024/073735
• 출원인 : SIKORA AG
• 특허번호 :
• IPC : G01B-011/06(2006.01)

Vertical semiconductor devices with deep wells and associated fabrication methods are disclosed herein. A disclosed process for forming a semiconductor device includes forming, on a drift region having a first conductivity type, a deep well region for the semiconductor device. The deep well region can be formed by an implant. The deep well region has a second conductivity type. The deep well region of the second conductivity type leaves a portion of the surface of the drift region exposed. The process also includes epitaxially forming a semiconductor region that extends from the surface of the drift region to above the deep well region for the semiconductor device. The semiconductor region can be used as at least a part of the main operational current path of the semiconductor device when the semiconductor device is finished and is devoid of implant damage from the implant.

• 출원번호 : 18813547
• 출원인 : Snyder, David Lee
• 특허번호 :
• IPC : H01L-023/552(2006.01);H01L-029/06(2006.01);H01L-029/66(2006.01);H01L-029/78(2006.01);

A product having ultraviolet radiation protection and antimicrobial protection has a quantity of synthetic material, a quantity of zinc oxide particles with each particle having a surface, the quantity of zinc oxide particles in the range of 0.05 percent to 0.10 percent, and a quantity of a reactive group for modifying each surface of each zinc oxide particle, the quantity of the reactive group for incorporating the quantity of zinc oxide particles into the quantity of synthetic material prior to the quantity of synthetic material being formed into a fiber.

• 출원번호 : 18813445
• 출원인 : Kramer, Robert B.
• 특허번호 :
• IPC : C09C-001/04(2006.01);C01G-009/02(2006.01);C01G-009/03(2006.01);C08K-003/22(2006.01);C08K-009/02(2006.01);C08K-009/04(2006.01);C08K-009/06(2006.01);C09C-003/12(2006.01);C11D-003/12(2006.01);D01F-001/10(2006.01);D06M-011/44(2006.01);D06M-011/46(2006.01);D06M-011/50(2006.01);D06M-011/70(2006.01);D06M-013/288(2006.01);D06M-013/325(2006.01);D06M-013/368(2006.01);D06M-013/432(2006.01);D06M-013/51(2006.01);D06M-023/08(2006.01);D06M-101/06(2006.01);D06M-101/32(2006.01);D06M-101/34(2006.01);