The invention relates to a microlithographic projection exposure system comprising a lighting system (10) and a projection objective (22). The lighting system (10) has a first set of optical elements (18, 19) which are designed to guide electromagnetic radiation emitted by a radiation source (14) onto a photomask (13) in order to illuminate the photomask (13) with the electromagnetic radiation. The projection objective (22) can have a second set of optical elements (M1-M6) in order to form an imaging beam path, by means of which the photomask (13) is imaged onto a lithography object. An actuator (33, 39, 67) can be designed to adjust an operating parameter of an optical element (18, 19) of the lighting system (10) or of an optical element (M1-M6) of the projection objective (22). The actuator (33, 39, 67) is electrically actuated via an input interface (42), wherein the electric actuation runs between the input interface (42) and the actuator (33, 39, 67) via a printed circuit board (70). The printed circuit board (70) is arranged in the interior of a housing (34), and the housing (34) is equipped with a cooling channel (46). The printed circuit board (70) is releasably connected to the housing (34) such that the printed circuit board (70) can be separated from the housing (34) without opening the cooling channel (46).
- 출원번호 : EP2024/078277
- 출원인 : CARL ZEISS SMT GMBH
- 특허번호 :
- IPC : G03F-007/20(2006.01)