PROBLEM TO BE SOLVED: To provide means to shield medical staff from X-rays to which a patient must be exposed, where the means does not encumber a user's body, allows access to the patient's body, and can be rapidly reconfigured if necessary.SOLUTION: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shields to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography. Sterile coverings are provided to ensure asepsis during a surgical procedure.SELECTED DRAWING: Figure 18

• 출원번호 : 2024177762
• 출원인 : RAMPART IC LLC
• 특허번호 :
• IPC : G21F-003/00(2006.01);A61B-006/10(2006.01);

Disclosed herein are systems for modifying nucleic acid splicing of a target RNA such as an mRNA. The system may be useful in a method such as a method for treating a genetic disorder such as epilepsy. The system may include an expression system, or a modified small nuclear RNA (snRNA) that includes an exonic splicing silencer (ESS) sequence, and an antisense nucleic acid sequence that targets the target RNA.

• 출원번호 : US2024/050793
• 출원인 : EMUGEN THERAPEUTICS LLC
• 특허번호 :
• IPC : C12N-015/113(2010.01);C12N-015/11(2006.01);A61K-048/00(2006.01);A61P-025/28(2006.01);

Disclosed herein are systems for modifying nucleic acid splicing of a target RNA. The system may be useful in a method such as a method for treating a genetic disorder such as epilepsy. The system may include an expression system, or a modified small nuclear RNA (snRNA) that includes an exonic splicing silencer (ESS) sequence, and a target nucleic acid sequence that targets the target RNA. Described herein are recombinant regulatory elements for expression systems. Also described are nucleic acid expression systems with recombinant regulatory elements.

• 출원번호 : US2024/050737
• 출원인 : EMUGEN THERAPEUTICS LLC
• 특허번호 :
• IPC : C12N-015/85(2006.01);C12N-015/11(2006.01);C12N-015/13(2006.01);

Method for time-resolved pump-probe resonance spectroscopy, with the steps: - exposing a sample (4) to a radio-frequency pump pulse (20), wherein the radio-frequency pump pulse (20) drives a resonance, wherein the resonance is an electron spin resonance and/or a nuclear magnetic resonance, wherein the sample (4) is within a magnetic bias field (22); - probing the sample (4) with an electron probe beam (7) from an electron source (6); - detecting a probe beam property of the electron probe beam (7) with a detector unit (8), wherein the probe beam property depends on a magnetic moment (25) of the sample (4), wherein the magnetic moment (25) depends on the driven resonance, wherein the detector unit (8) is configured to detect the probe beam property of the electron probe beam (7) with a temporal resolution for a time-resolved detection of the driven resonance; and determining a property of the resonance, in particular the state of the resonance, preferably a change of the state of the resonance, based on the detected probe beam property.

• 출원번호 : AT2024/060400
• 출원인 : TECHNISCHE UNIVERSITÄT WIEN;
• 특허번호 :
• IPC : H01J-037/26(2006.01);G01N-024/08(2006.01);G01N-024/10(2006.01);G01R-033/60(2006.01);

A radiation imaging apparatus includes: an image data acquisition unit which acquires a radiographic image that is related to a photography mode selected from a plurality of photography modes; an offset correction data acquisition unit which acquires an offset correction data corresponding to each of the plurality of photography modes; an offset correction unit which corrects the radiographic image with use of acquired offset correction data; a determination unit which determines, out of the plurality of photography modes, a group of photography modes for which common offset correction data shared with one another is usable, and selects, out of offset images corresponding to respective photography modes in the group, an offset image to be used in offset correction; and an update unit which updates, in order to execute offset correction of the photography modes in the group, the selected offset image to a corresponding offset image.

• 출원번호 : 18911534
• 출원인 : UMEKAWA, KAZUAKI
• 특허번호 :
• IPC : A61B-006/58(2024.01)

The present invention relates to an electrode plate manufacturing apparatus including a first laser radiation unit that radiates a first laser beam in a first direction perpendicular to an electrode film located between rollers of a transfer device to notch at least a portion of the electrode film and a second laser radiation unit that radiates a second laser beam to a notched area of the electrode film, which is notched by the first laser radiation unit, to remove a material of a surface of the electrode film melted by the first laser beam.

• 출원번호 : 18912443
• 출원인 : Philenergy Co., Ltd
• 특허번호 :
• IPC : B23K-026/38(2014.01);H01M-004/04(2006.01);

The invention relates to biosensors and three-dimensional electrodes, which can be used for manufacturing electrochemical biosensors. The claimed process for obtaining of a three-dimensional electrode comprising the steps of: (i) providing a solid silicone-based formative bed, defining the three-dimensional electrode dimensions; (ii) introducing a UV curable polymer into the formative bed; (iii) positioning a mask over the formative bed filled with the UV curable polymer; wherein the mask comprises predefined patterns corresponding to a lattice structure, the patterns having areas that are transparent to UV light to define cells and supporting pillars of the lattice, and areas that are non-transparent to UV light to block UV exposure; (iv) exposing the UV curable polymer to UV light through the mask at a defined optical angle, such that the angled UV light exposure through the transparent areas of the mask defines the formation of cells and leaning supporting pillars of the lattice, while the areas of the mask that are non-transparent to UV light block the UV exposure; (v) removing the uncured portions of the UV curable polymer by a solvent, thereby revealing the three-dimensional lattice structure comprising cells and supporting pillars; (vi) subjecting the element obtained at a previous step to a treatment selected from thermal, chemical, physical, or radiation-based methods to impart a hydrophilic surface characteristic to the element; (vii) depositing a conductive layer onto the element's three-dimensional lattice structure, via an electroless plating by a deposition of at least 50 nm of a base or noble metal or metal alloy via reduction of metal ions in presence of a reducing agent.

• 출원번호 : LV2024/050013
• 출원인 : LATVIJAS UNIVERSITATES CIETVIELU FIZIKAS INSTITUTS
• 특허번호 :
• IPC : G01N-027/327(2006.01);G01N-033/53(2006.01);G03F-007/00(2006.01);G03F-007/20(2006.01);

The invention relates to an adjustment method (10) for adjusting a beam caustic (12), in particular a focal position (18), of a laser beam (14) of a laser beam unit (22) having an optical device (52), in particular for generating extreme ultraviolet radiation (EUV), comprising the method steps of: a) ascertaining (24) three beam diameters (26, 32, 36, 40) of the laser beam (14) at three measurement planes (28, 30, 34, 38) positioned along the laser beam propagation direction (16); b) determining (42) the beam caustic (12) of the laser beam (14) by analytically calculating beam propagation parameters of the laser beam (14) on the basis of the three ascertained beam diameters (26, 32, 36, 40); c) ascertaining (46) a laser beam deviation by comparing the beam caustic (12) with a target beam caustic (48) of the laser beam (14); d) adjusting (50) the laser beam unit (22), in particular the optical device (52), according to the ascertained laser beam deviation. The invention also relates to an adjustment system (58) and to a laser beam unit (22).

• 출원번호 : EP2024/078574
• 출원인 : TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE
• 특허번호 :
• IPC : G01J-001/42(2006.01);G01J-001/02(2006.01);G01J-001/30(2006.01);H01S-003/00(2006.01);

Provided herein are combination therapy methods, compositions and uses involving adoptive T cell therapies, such as tumor infiltrating lymphocyte (TIL) therapies and low dose radiation therapy (LDRT). In some embodiments, the combination therapy methods, composition and uses also involve a chemotherapeutic regimen and/or a checkpoint inhibitor.

• 출원번호 : US2024/050815
• 출원인 : TURNSTONE BIOLOGICS CORP.
• 특허번호 :
• IPC : A61K-031/00(2006.01);A61K-035/17(2025.01);A61K-038/20(2006.01);A61K-039/00(2006.01);A61N-005/00(2006.01);A61P-035/00(2006.01);C07K-016/00(2006.01);

This disclosure relates to methods and systems for determining epigenetic states resulting from epigenetic modifying processes, particularly by use of molecules dynamics and models of epigenetic modifying processes.

• 출원번호 : US2024/050764
• 출원인 : ALTOS LABS, INC.
• 특허번호 :
• IPC : G16B-030/00(2019.01);G06N-003/08(2023.01);G06N-003/0985(2023.01);G16B-040/30(2019.01);G16B-020/00(2019.01);