One variation of a system includes a pressure vessel: including a wall; defining a primary working fluid circuit extending vertically within the wall; defining a secondary working fluid circuit extending vertically within the wall and fluidly isolated from the primary working fluid circuit; and configured to store a nuclear fuel, a primary working fluid, and a secondary working fluid. The wall of the pressure vessel: defines a heat exchanger configured to transfer thermal energy from the primary working fluid flowing through the primary working fluid circuit into the secondary working fluid flowing through the secondary working fluid circuit; and defines a radiation shield configured to attenuate radiation emitted by the nuclear fuel.

• 출원번호 : 19301579
• 출원인 : Kugelmass, Bret
• 특허번호 :
• IPC : G21C-013/087(2006.01);G21C-011/08(2006.01);G21C-013/028(2006.01);G21C-015/04(2006.01);G21C-015/12(2006.01);G21C-015/243(2006.01);G21C-015/26(2006.01);

A tool for machining a workpiece includes an elongated shaft that has a first shaft end and a second shaft end opposite the first shaft end. A tool head is arranged at the second shaft end. The elongated shaft includes a measuring channel for optical measuring radiation that extends from the first shaft end to the second shaft end. The measuring channel includes an optical measuring surface at an end that faces the second shaft end. The optical measuring surface is configured to reflect optical measuring radiation coupled in via the first shaft end at least partially back to the first shaft end. The optical measuring surface is also configured to vary a property of back-reflected measuring radiation as a function of a relative position of the first shaft end with respect to the second shaft end.

• 출원번호 : 19301607
• 출원인 : Gutekunst GmbH
• 특허번호 :
• IPC : B23B-051/06(2006.01);B23B-049/00(2006.01);

The sulfonium salt monomer has the formula (A). The chemically amplified positive resist composition can be processed by photolithography using, in particular, high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV, has good solvent solubility, and is excellent in lithographic performance such as resolution, LER and a pattern profile.

• 출원번호 : 19300966
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-381/12(2006.01);G03F-007/00(2006.01);G03F-007/039(2006.01);G03F-007/32(2006.01);

The present disclosure relates to compositions, methods and related uses for preventing, inhibiting, ameliorating or delaying (slowing): (i) the thinning of the retinal outer nuclear layer (ONL), and/or (ii) reduction in total retinal thickness in a subject. The present disclosure further relates generally to compositions, methods and related uses for protecting: (i) the retinal outer nuclear layer (ONL) and/or the retina from light- or age-induced damage, and/or (ii) photoreceptors from light- or age-induced damage. In particular, the present technology relates to administering bevemipretide, or a pharmaceutically acceptable salt, stereoisomer, tautomer, hydrate, and/or solvate thereof to subjects in need thereof.

• 출원번호 : 19301213
• 출원인 : Stealth BioTherapeutics Inc.
• 특허번호 :
• IPC : A61K-038/06(2006.01);A61K-045/06(2006.01);A61P-027/02(2006.01);

The present disclosure relates to compositions, methods and related uses for preventing, inhibiting, ameliorating or delaying (slowing): (i) the thinning of the retinal outer nuclear layer (ONL), and/or (ii) reduction in total retinal thickness in a subject. The present disclosure further relates generally to compositions, methods and related uses for protecting: (i) the retinal outer nuclear layer (ONL) and/or the retina from light- or age-induced damage, and/or (ii) photoreceptors from light- or age-induced damage. In particular, the present technology relates to administering bevemipretide, or a pharmaceutically acceptable salt, stereoisomer, tautomer, hydrate, and/or solvate thereof to subjects in need thereof.

• 출원번호 : US2025/042187
• 출원인 : STEALTH BIOTHERAPEUTICS INC.
• 특허번호 :
• IPC : A61K-031/4245(2006.01);A61P-027/02(2006.01);A61K-038/05(2006.01);A61K-038/16(2006.01);A61K-045/06(2006.01);

Disclosed herein are various embodiments for radiation-hardened, SEU tolerant configuration FFs for standard cell-based eFPGA fabrics. These various embodiments include a dual-storage-mode (DSM) FF, a dual-modular redundant slave latch (DMR-SL) FF and a HALF-DICE FF. These embodiments assume that a radiation strike is likely to affect only one element of a radiation-hardened FF and provide additional circuitry to introduce an automatic refresh feature into the designs sufficient to recover from an SEU.

• 출원번호 : US2025/041924
• 출원인 : CARNEGIE MELLON UNIVERSITY
• 특허번호 :
• IPC : H03K-019/003(2006.01);F15C-001/10(2006.01);H03K-003/037(2006.01);H03K-003/3562(2006.01);H10B-010/10(2023.01);H10B-063/00(2023.01);

A waveguide apparatus and a related product are provided. The waveguide apparatus includes a first waveguide cavity, a first radiation port, and a second radiation port. A spacing between a radiation end of the first radiation port and a radiation end of the second radiation port is less than a spacing between a connection end of the first radiation port and a connection end of the second radiation port. The connection end of the first radiation port and the connection end of the second radiation port are both connected to the waveguide cavity.

• 출원번호 : 19299697
• 출원인 : Shenzhen Yinwang Intelligent Technologies Co., Ltd.
• 특허번호 :
• IPC : H01P-003/12(2006.01)

The present invention relates to a method for applying an image onto a receiving medium, wherein the image is applied onto the recording medium by depositing a UV-curable ink and the ink is irradiated with radiation, wherein the radiation comprises two types of UV radiation. The present invention further relates to a printing apparatus and a software product.

• 출원번호 : 19299720
• 출원인 : Canon Production Printing Holding B.V.
• 특허번호 :
• IPC : B41J-011/00(2006.01);B41M-007/00(2006.01);

The present disclosure relates to a bryophyte cell that is transformed or genetically modified to express and . The and may be expressed as a single biscistronic cassette separated by a P2A peptide or separately through insertion of two unique gene cassettes into said bryophyte cell. The expression may be driven by an exogenous promoter. The transformed bryophyte cell may be exposed to UV radiation to enhance production of exogenous flavonoids.

• 출원번호 : CA2025/051067
• 출원인 : BRYOSPHERE BIOTECHNOLOGIES INC.
• 특허번호 :
• IPC : C12N-005/10(2006.01);A01H-011/00(2006.01);C12N-009/02(2006.01);C12N-009/10(2006.01);C12N-013/00(2006.01);C12N-015/53(2006.01);C12N-015/54(2006.01);C12N-015/82(2006.01);C12N-015/90(2006.01);C12P-017/06(2006.01);

A trap for catching or killing insects includes a back housing, an insect capture or killing mechanism, an insect attracting light source including light emitting diodes (LEDs) which emit ultra violet (UV) radiation through a lens, and a cover including one or more openings allowing insects to enter the trap, through which insect attracting light is dispersed.

• 출원번호 : 19299987
• 출원인 : Kaye, Mathew V.
• 특허번호 :
• IPC : A01M-001/04(2006.01)