A method for controlled selective irradiation of a target zone of a surface to allow local radiation of this target zone to obtaining a target effect. The method is implemented by a system including an emitter device, at least one measurement and analysis device and a controller device. The method includes: measuring and recording in real time the real main energy at the target zone; analyzing and recording the real effect obtained at this target zone; and controlling in real time the emitter device by the controller device, while taking into account the measurement of the real main energy and the analysis of the real effect, which are compared respectively to a predetermined energy threshold associated with the target zone and to the expected target effect, so that, if the predetermined energy threshold is not reached but the target effect is obtained, the irradiation of the target zone is stopped.

• 출원번호 : 18920466
• 출원인 : ETIENNE, Stéphane
• 특허번호 :
• IPC : B29C-064/393(2017.01);B29C-064/282(2017.01);B33Y-010/00(2015.01);B33Y-050/02(2015.01);

A method for characterizing a lithography apparatus, in particular, a method for characterizing a lithography apparatus configured to cause an obscuration of radiation, as well as a lithography apparatus and a computer program product configured to carry out the methods. A method for characterizing a lithography apparatus; detecting first diffracted radiation of the lithography apparatus, wherein the first diffracted radiation was diffracted at a characterization element; determining a diffraction property of the characterization element based on at least in part the first substantially undiffracted radiation and the first diffracted radiation.

• 출원번호 : 18920238
• 출원인 : BUSCHLINGER, Robert
• 특허번호 :
• IPC : G03F-007/00(2006.01)

A method for producing a semiconductor substrate includes: applying a silicon-containing composition directly or indirectly to a substrate to form a silicon-containing film; applying a composition for forming a resist film to the silicon-containing film to form a resist film; exposing the resist film to radiation; and developing at least the exposed resist film. The silicon-containing composition includes: a silicon-containing compound; a polymer including a structural unit represented by formula (1); and a solvent. A content of the silicon-containing compound in the silicon-containing composition relative to 100% by mass of components other than the solvent in the silicon-containing composition is from 50% to 99.9% by mass. RA1 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and RA2 is a monovalent organic group having 1 to 20 carbon atoms.

• 출원번호 : 18919818
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/00(2006.01);C08K-005/5419(2006.01);C09D-133/06(2006.01);G03F-007/039(2006.01);G03F-007/075(2006.01);G03F-007/16(2006.01);H01L-021/027(2006.01);

In a method of forming a pattern, a photo resist layer is formed over an underlying layer, the photo resist layer is exposed to an actinic radiation carrying pattern information, the exposed photo resist layer is developed to form a developed resist pattern, a directional etching operation is applied to the developed resist pattern to form a trimmed resist pattern, and the underlying layer is patterned using the trimmed resist pattern as an etching mask.

• 출원번호 : 18920346
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/00(2006.01);G03F-001/22(2006.01);G03F-001/36(2006.01);G03F-001/70(2006.01);G03F-007/40(2006.01);H01L-021/027(2006.01);

A treatment planning system is provided. The treatment planning system includes one or more processors, a memory, and one or more application programs, wherein the one or more application programs are stored in the memory and, when loaded and run by the one or more processors, cause the one or more processors to: acquire a target volume image; acquire arc information, wherein the arc information indicates that a rotation angle for which a radiation source continuously arcs along a first direction is greater than or equal to 360 degrees; acquire prescription dose information, wherein the prescription dose information includes target radiation doses for different regions; and generate a treatment plan based on the target volume image, the arc information, and the prescription dose information.

• 출원번호 : 18920687
• 출원인 : CHENG, Hong
• 특허번호 :
• IPC : G16H-020/40(2018.01);A61N-005/10(2006.01);

A zinc injection control method and apparatus, a zinc injection system, a computer device, a computer-readable storage medium, and a computer program product. The method comprises: controlling a zinc injection apparatus to perform zinc injection on a loop of a nuclear power plant at a preset zinc injection flow rate; acquiring a real-time zinc concentration and real-time parameters of a unit of the loop; and on the basis of the real-time zinc concentration, the real-time parameters of the unit of the loop and a standard concentration range, performing control on the zinc injection.

• 출원번호 : CN2024/125827
• 출원인 : CHINA NUCLEAR POWER ENGINEERING CO., LTD.;CHINA NUCLEAR POWER DESIGN COMPANY LTD. (SHENZHEN);
• 특허번호 :
• IPC : G21D-003/08(2006.01);G21F-009/00(2006.01);G21C-017/022(2006.01);

According to an embodiment, a lighting device may comprise: a heat radiation plate; a circuit board disposed on the heat radiation plate; a light source unit disposed on the heat radiation plate and including a light emitting device; and a plurality of connection members connecting the circuit board and the light source unit, wherein the light source unit includes a plurality of bonding pads, the circuit board includes a plurality of pads, each of the plurality of connection members includes one end individually connected to one of the bonding pads, the other end individually connected to one of the bonding pads, and a connection part connecting the one end and the other end, and the connection part includes a convex part convex toward the heat radiation plate.

• 출원번호 : KR2024/015922
• 출원인 : LG INNOTEK CO., LTD.
• 특허번호 :
• IPC : F21K-009/238(2016.01);F21V-029/74(2015.01);H10H-020/858(2025.01);H10H-020/857(2025.01);H10H-020/852(2025.01);

An optical measurement system, the optical measurement system comprises optics, wherein the optics include a collection path and an illumination path and an objective lens. The optics is configured to acquire Raman spectrums of one or more structural elements located at a measurement site of the sample while being set-up to apply one or more optics parameters that comprise an illumination angle out of a set of multiple illumination angles that correspond to a numerical aperture of the objective lens. Each of the one or more structural elements has a dimension that ranges between one tenth of nanometer to one hundred microns; an optical spectrometer; a Raman detector that is downstream to the optical spectrometer; and a control unit that is configured to determine an expected radiation pattern to be detected by the Raman detector when the optics are set-up to apply the one or more optics parameters.

• 출원번호 : 18920791
• 출원인 : NOVA LTD.
• 특허번호 :
• IPC : G01J-003/447(2006.01);G01J-003/02(2006.01);G01J-003/10(2006.01);G01J-003/44(2006.01);G01N-021/65(2006.01);

The present disclosure is directed to poloxamers linked to small molecules, as well as compositions thereof and uses therefor. The small molecules linked to the poloxamers may be one or more antioxidant compounds that modify the presence of redox molecules such as reactive oxygen species. These poloxamers linked to small molecules may, for example, be used to treat neurodegenerative diseases, muscular dystrophy, burns, and/or radiation oncology patients.

• 출원번호 : US2024/051788
• 출원인 : MUSC FOUNDATION FOR RESEARCH DEVELOPMENT
• 특허번호 :
• IPC : A61K-047/34(2017.01);A61K-009/06(2006.01);A61P-017/02(2006.01);A61P-021/00(2006.01);A61P-025/28(2006.01);C08G-065/334(2006.01);

A heating element for heating an aerosol-forming substrate of an aerosol-generating article received in an aerosol-generating device, comprises a heating base element configured to heat the aerosol-forming substrate at least by means of heat radiation; and a coating material, such as aluminium nitride, provided on the heating base element. The coating material is configured to increase an amount of heat radiation absorbed by a first chemical component of the aerosol-forming substrate, such as nicotine, propylene glycol or glycerine, and to reduce an amount of heat radiation absorbed by a second chemical component of the aerosol-forming substrate such as water. The heating element may be an internal heating element of the aerosol-generating device, or may be an external susceptor of the aerosol-generating article.

• 출원번호 : EP2024/079350
• 출원인 : JT INTERNATIONAL SA
• 특허번호 :
• IPC : A24D-001/20(2020.01);A24F-040/46(2020.01);A24F-040/465(2020.01);